Kluwer, Date: 1989. 1000 pp., Paperback, ex library else text clean and binding tight. - If you are reading this, this item is actually (physically) in our stock and ready for shipment once ordered. We are not bookjackers. Buyer is responsible for any additional duties, taxes, or fees required by recipient's country. 1989. Kluwer ISBN 0792301544 9780792301547 [US]

Very Good. ISBN 0792301544 9780792301547 [US]

Kluwer 1989 Trade paperback 1000 pp., Paperback, ex library else text clean and binding tight. -If you are reading this, this item is actually (physically) in our stock and ready for shipment once ordered. We are not bookjackers. Buyer is responsible for any additional duties, taxes, or fees required by recipient's country.

ISBN10: 0792301544, ISBN13: 9780792301547, [publisher: Springer Netherland] Softcover Gepflegter, sauberer Zustand. Außen: Knick. 3027062/2 Altersfreigabe FSK ab 0 Jahre Softcover reprint of the original 1st ed. 1989.
[Trebbin, Germany] [Publication Year: 1989]

ISBN10: 0792301544, ISBN13: 9780792301547, [publisher: Springer Netherland] Softcover Gepflegter, sauberer Zustand. Außen: Knick. 3027062/2 Altersfreigabe FSK ab 0 Jahre Softcover reprint of the original 1st ed. 1989.
[Trebbin, Germany] [Publication Year: 1989]

ISBN10: 0792301544, ISBN13: 9780792301547, [publisher: Springer Netherlands] Softcover Druck auf Anfrage Neuware - Printed after ordering - The primary thrust of very large scale integration (VLS!) is the miniaturization of devices to increase packing density, achieve higher speed, and consume lower power. The fabrication of integrated circuits containing in excess of four million components per chip with design rules in the submicron range has now been made possible by the introduction of innovative circuit designs and the development of new microelectronic materials and processes. This book addresses the latter challenge by assessing the current status of the science and technology associated with the production of VLSI silicon circuits. It represents the cumulative effort of experts from academia and industry who have come together to blend their expertise into a tutorial overview and cohesive update of this rapidly expanding field. A balance of fundamental and applied contributions cover the basics of microelectronics materials and process engineering. Subjects in materials science include silicon, silicides, resists, dielectrics, and interconnect metallization. Subjects in process engineering include crystal growth, epitaxy, oxidation, thin film deposition, fine-line lithography, dry etching, ion implantation, and diffusion. Other related topics such as process simulation, defects phenomena, and diagnostic techniques are also included. This book is the result ...