ISBN10: 354041682X, ISBN13: 9783540416821, [publisher: Springer] Hardcover
[Bayonne, NJ, U.S.A.] [Publication Year: 2001]
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Springer Verlag 2001 2001 ed. Hardcover New 1st edition. 273 pages. 9.25x6.00x0.50 inches.

ISBN10: 354041682X, ISBN13: 9783540416821, [publisher: Springer] Hardcover Buy with confidence! Book is in good condition with minor wear to the pages, binding, and minor marks within
[Amherst, NY, U.S.A.] [Publication Year: 2001]

Hardback. New. Discusses silicon oxidation in a tutorial fashion from both experimental and theoretical viewpoints. The authors report on the state of the art both at Lucent Technology and in academic research. The book will appeal to researchers and advanced students. ISBN 354041682x 9783540416821 [GB]

Springer Verlag, Date: 2001. Hardcover. New. 1st edition. 273 pages. 9.25x6.00x0.50 inches. 2001. Springer Verlag ISBN 354041682X 9783540416821 [GB]

ISBN10: 354041682X, ISBN13: 9783540416821, [publisher: Berlin/Heidelberg/New York/Barcelona/Hong Kong/London/Milan/Paris/Singapore/Tokyo, Springer.] Hardcover 24 cm. 147 figs., 21 in color, XIII, 260 p. Hardcover Versand aus Deutschland / We dispatch from Germany via Air Mail. Einband bestoßen, daher Mängelexemplar gestempelt, sonst sehr guter Zustand. Imperfect copy due to slightly bumped cover, apart from this in very good condition. Stamped. Springer series in materials science ; 46 Physics and astronomy online library Sprache: Englisch.
[Berlin, B, Germany] [Publication Year: 2001]

ISBN10: 354041682X, ISBN13: 9783540416821, [publisher: Berlin/Heidelberg/New York/Barcelona/Hong Kong/London/Milan/Paris/Singapore/Tokyo, Springer.] Hardcover 24 cm. 147 figs., 21 in color, XIII, 260 p. Hardcover Versand aus Deutschland / We dispatch from Germany via Air Mail. Einband bestoßen, daher Mängelexemplar gestempelt, sonst sehr guter Zustand. Imperfect copy due to slightly bumped cover, apart from this in very good condition. Stamped. Springer series in materials science ; 46 Physics and astronomy online library Sprache: Englisch.
[Berlin, B, Germany] [Publication Year: 2001]

ISBN10: 354041682X, ISBN13: 9783540416821, [publisher: Springer Berlin Heidelberg] Softcover Druck auf Anfrage Neuware - Printed after ordering - The idea for a book dealing specifically with elementary processes in silicon oxidation was formulated after a stimulating symposium that I organized at the American Physical Society meeting in March, 1998. The symposium, en titled 'Dynamics of silicon etching and oxidation', explored the mechanisms governing silicon oxidation. With three experimental talks (Hines, Weldon and Gibson) and two theoretical presentations (Pasquarello and Pantelides), it provided a good cross-section of the recent efforts to characterize the in terfacial region of silicon oxide grown on silicon. The novelty of this work comes from the present experimental and theo retical advances that allow the investigation of the formation of ultra-thin silicon oxides. Although structural characterization of bulk silicon oxides and electrical characterization of thin oxides and their interfaces with silicon have produced an extensive body of work over more than forty years, a mechanis tic understanding of the initial oxidation processes has remained elusive. In the past, both the experimental and theoretical efforts have been thwarted by the complexity of dealing with the formation of a mostly amorphous oxide on a crystalline substrate. In this book we present a survey of the state-of-the-art methods, both ex perimental and theoretical, ...
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